---
title: Semiconductor - Advanced Materials
description: Advanced Materials in the wafer process consists of three steps, grinding, lapping, polishing, and CMP.
image: https://www.engis.com/hubfs/Sic%20Wafers%20.png
---

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# Advanced Materials Wafer Process - Grinding, Lapping, Polishing & CMP

 

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## Semiconductor Wafer Processing

The demands of today’s most advanced electronic devices drive the need to process new and challenging substrate materials. The subsurface damage-free surface requires consideration of the entire process and requires that each step is paired to the particular needs of the material. Engis can provide complete solutions for your advanced semiconductor wafer processing needs:

 

 

## Wafer Processing

GRIND LAP POLISH  
&  
CMP

[### SiC Silicon Carbide

](https://www.engis.com/sic-wafer-grinding)

### AL2O3 Sapphire

### GaN Gallium Nitride

### [InP Indium Phosphide](https://www.engis.com/indium-phosphide-wafer-grinding)

### AlN Aluminium Nitride

### GaAs Gallium Arsenide

### Diamond

### Si3N4 Silicon Nitride

### GA2O3 Gallium Oxide

### Ge Germanium

### Si Silicon

### Glass

### What is your advanced material challenge?

 

| ![WAFER LAPPING (3)](https://www.engis.com/hs-fs/hubfs/WAFER%20LAPPING%20(3).png?width=445&height=356&name=WAFER%20LAPPING%20(3).png) | ![WAFER GRINDING (1)](https://www.engis.com/hs-fs/hubfs/WAFER%20GRINDING%20(1).png?width=445&height=356&name=WAFER%20GRINDING%20(1).png) |
| --- | --- |

 

 

 

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