Hyprez Polishing Pads

Engis offers a full selection of polishing pads and cloths to meet demanding polishing and planarization requirements for industrial as well as advanced materials. In addition to industry standard pads, Engis can engineer special pads to meet your needs.

Qualification criteria make our cloths the best available in the industry. Using an array of test materials and slurries, extensive evaluations are performed to ensue these pads meet Engis exacting standards for optimum performance.

The production of an exacting surface finish on silicon or other semiconductor crystals has become more demanding and it has become highly critical to meet the requirements of today's semiconductor industry. At Hyprez we strive to meet the ever-changing needs of the industry. We offer various polishing pad types depending on your final polishing requirements and characteristics. We offer surface roughness, removal rat, and edge rounding options.

PM-700	Microcell pad made from buffed polyurethane with microscopic voids, laminated to non-woven
PM-710	Microcell pad made from buffed polyurethane with microscopic voids, laminated to non-woven
HY NAP700	Nap/flock pad made with long viscose fibers
HY NAP 730	Nap/flock pad made with long viscose fibers on the woven substrate
HY NAP 780	Nap/flock pad made with thin, short viscose fibers on the woven substrate
HY NAP 800	Nap/flock pad made with short viscose fibers on the woven substrate
ATP 600	Thick non-woven made from polyester/polypropylene fibers with a buffed surface

Pad Image

Pad Applications: Optical components: LiNbO₃, CaF₂, MgF₂, Si, Ge, KTP, DKDP, etc. Planarization of MEMS structures Semiconductor materials: InP, Sapphire, GaSb, Si, SiC, GaN, etc. Polishing of high-grade metal substrates: Titanium, Nickel, Copper, Gold, etc. Industrial metals: Aluminum, Carbide, Steel, Bronze, etc. Industrial Ceramics, Glass & Quartz
Type	Pad Name	Thickness (mm)	Hardness (Shore A)	Surface	Max Diameter (mm)	Material Description	Application
Micro Cell	PM700	1.5	72	Embossed or Perforated	1360	Microcell pad made from buffed polyurethane with microscopic voids, laminated to non-woven	Final polishing of metals and plastics
Micro Cell	PM710	1.2	74		1360		Final polishing of metals and plastics
Medium Nap	HY NAP 700	1.1	86	N/A	980	Nap/flock pad made with long viscose fibers	Final Polishing of metals and plastics
	HY NAP 730	1.12	85		1360	Nap/flock pad made with long viscose fivers on a woven substrate
	HY NAP 780	0.7	87		1440	Nap/flock pad made with thin and short viscose fibers on a woven substrate
	HY NAP 800	1	83		1440	Nap/flock pad made with short viscose fibers on a woven substrate
Thick Non Woven	ATP 600	3.8	60	Embossed or smooth	1440	Made from polyester/ polypropylene fibers, buffed surface	Final polishing of glass with Hyprez cerium oxide slurries; good coverage of rounded edges

Hyprez® Polishing Pads

Hyprez^® Polishing Pads